Shallow trench isolation - Wikipedia

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PDF) Highly Manufacturable 32Gb Multi -- Level NAND Flash Memory with 0.0098 μm2 Cell Size using TANOS(Si - Oxide - Al2O3 - TaN) Cell Technology

File:Shallow trench isolation process.svg - Wikipedia

Shallow Trench Isolation - an overview

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What is trench isolation? Explain its use in VLSI technology.

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